Application Note: Implementing an Efficient DRC Code for Use with Design Workshop dw-2000
Description of an efficient design rule checking (DRC) code for the verification of planar lightwave circuits, for use with Design Workshop dw-2000
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Prepared by Rasmus Brandt, IAESTE Intern at CMC Microsystems, MSc Student, Faculty of Science and Technology, Uppsala University, Sweden.
This application note describes how to develop an efficient design rule checking (DRC) code for the verification of planar lightwave circuits, for use with Design Workshop dw-2000, a mask layout tool. The code can handle complex structures, such as photonic crystals, while still running at a moderate speed on a desktop computer. The user can receive instantaneous visual feedback on rule violations in the design, because the code runs within the mask layout software.
The intended users of this note are the researchers who wish to develop their own custom DRC code for photonic designs. However, anyone interested in splitting up computational tasks using data partitioning may find this application note useful.
All CMC Microsystem account holders with a Prototyping or Designer Subscription are authorized to access this application note. For more information contact Linda Dougherty at email@example.com or 613-530-4787.
|Introduction Date:||August 18, 2009|
|Last Updated:||February 28, 2018|
|Delivery Method:||CMC Download|
|Client Access:||CMC Download|