Fab: AMS 0.35 µm CMOS Process Technology (Opto)

Fab: AMS 0.35 µm CMOS Process Technology (Opto)
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Research
Peer Reviewed Price for Canadian Academic
$225.00
Price for Canadian Academics
$1,250.00

Description

This 0.35-micron CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining.

CMC's multi-project wafer service delivers this technology from austriamicrosystems through partnership with Circuits Multi Projets (CMP) in France, offering three processes: Basic, Opto (see details below) and High-Voltage. The technology is suitable for:

  • Embedded photodiodes, high-density CMOS imaging and optoelectronic detection
  • High-voltage operation (maximum 20V gate, 50V operating voltage)
  • Mixed-signal designs
  • High-speed digital circuits
  • For the Basic and Opto processes, bulk micromachining of MEMS structures

Potential applications include:

  • Biomedical imaging
  • Automotive and environmental sensors

Opto Process (C35B4O1) Details:

  • Technology Features:
    • 4 metal and 2 poly layers (similar to basic option)
    • igh-efficiency photodiode and anti-reflective coating for imaging and optoelectronic detection applications
  • Supply Voltage: 3.3/5V
  • Bulk-micromachining option, allowing monolithic implementation of MEMS and microelectronics
  • For more details see:
    http://cmp.imag.fr/products/ic/?p=AMSC35B4O1

Note: The expected number of chips to be delivered for this technology is 25.

Licensing Requirements or Restrictions

Please see Help with Licensing to review licensing procedure. For more information, contact our License Administrator at licensing@cmc.ca or 613-530-4787.

Acknowledging CMC

If your research benefits from products and services provided by CMC Microsystems, please acknowledge this support in any publications about your work. For more information, please visit Acknowledge CMC.