Fab: AMS 0.35 µm CMOS Process Technology (High-Voltage)

Fab: AMS 0.35 µm CMOS Process Technology (High-Voltage)
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This 0.35-micron CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining.

CMC's multi-project wafer service delivers this technology from austriamicrosystems through partnership with Circuits Multi Projets (CMP) in France, offering three processes: Basic, Opto and High-Voltage (see details below). The technology is suitable for:

  • Embedded photodiodes, high-density CMOS imaging and optoelectronic detection
  • High-voltage operation (maximum 20V gate, 50V operating voltage)
  • Mixed-signal designs
  • High-speed digital circuits
  • For the Basic and Opto processes, bulk micromachining of MEMS structures

Potential applications include:

  • Biomedical imaging
  • Automotive and environmental sensors

High-Voltage Process (H35B4D3) Details:

Note: The expected number of chips to be delivered for this technology is 25.

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