Application Note: Inter-Reticle Stitching Rules and Constraints for a Wafer-Scale Integrated Circuit
This application note describes inter-reticle stitching rules and constraints for a wafer-scale integrated circuit.
Minimum Subscription Required:
- Yvon Savaria, Professor, Department of Electrical Engineering Department, École Polytechnique de Montréal
- Yves Blaquière, Professor, Département d'informatique, Faculté des sciences, UQAM
- Walder Andre, Postdoctoral Fellow, Department of Electrical Engineering Department, École Polytechnique de Montréal;
in co-operation with CMC Microsystems.
This application note describes inter-reticle stitching rules and constraints for a wafer-scale integrated circuit. It shows a process of reticle stitching and the design considerations of using such a stitching technique to create designs larger than the maximum reticle size.
All CMC Microsystem account holders from a member university with a Prototyping or Designer Subscription are authorized to access this application note. For more information contact Linda Dougherty at firstname.lastname@example.org or 613-530-4787.
|Introduction Date:||September 23, 2011|
|Last Updated:||April 11, 2018|
|Support Level:||Information Only|
|Delivery Method:||CMC Download|
|Client Access:||CMC Download|