User Guide: Characterization of Plasma Preen System

Plasma cleaning is an important process in micro- and nanofabrication to etch (remove) organic materials from a substrate surface. An experiment was conducted to study the etching rates of an oxygen plasma treatment of common organic materials, under different plasma Radio Frequency (RF) power and plasma treatment durations, using a Plasma-Preen II plasma cleaner. This document provides detailed description of the experiment, including materials used and procedure steps, to guide you through the same or a similar experiment when needed in your research.