Standard Operating Procedure: IMP SF-100 XPress Maskless Photolithography
This document provides information needed for standard operation of Intelligent Micro Patterning’s SF-100 XPress Maskless Photolithography System at the NanoFabrication Kingston (NFK) lab. Up-to-date system performance, specifications, and configurations may be subject to change. The SF-100 system, as shown in Figure 1, is a maskless UV exposure system used in photolithographic processing, accommodating sample sizes up to 150 mm wafers. The available exposure wavelengths are 365 nm and 434 nm.
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