Fab: Optoelectronic/Photonic Process Technology: III-V Epitaxy on GaAs Substrates
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Research
Description
Prototyping services on GaAs substrate supported by CMC engineer, streamline prototyping variety of structures for optoelectronics, photonics researches and applications.
CMC provides access to industrial standard foundries at subsidized rates. The foundries grow epitaxial wafers on GaAs substrates via Molecular Beam Epitaxy (MBE) and Metal-Organic Chemical Vapor Deposition (MOCVD). Custom processes applied on a case-by-case basis realizing the desired specification and functionality. In addition, metrology services are provided. Some of them are at cost recovery based.
Details on MBE epitaxy on GaAs Substrate:
- Epitaxy: GaAs, AlGaAs, InGaAs, Diluted Nitrides and Antimonites
- Dopant: p-type (Be), n-type (Si)
- Substrate crystal orientation: (100) or 2 degree off (100)
- Substrate dimension: 3” or 4” wafers, up to 3 wafers per MBE run
- Substrate conductivity: n-type, p-type or semi-insulating
- Typical epitaxial structure type: Super-lattices, Multi Quantum Well (MQW), Quantum Dots, detector-like structures with low background impurity, low temperature growth, high mobility materials
Details on MOCVD epitaxy on GaAs substrate:
- Epitaxy: GaAs, AlGaAs, InGaAs, AlInGaAs, InGaP,
- Dopant: p-type (C or Zn), n-type (Si)
- Substrate crystal orientation: (100) or 2 degree off (100)
- Substrate dimension: Up to six 3” or 4” wafers per MOCVD run
- Substrate conductivity: n-type, p-type or semi-insulating
- Typical epitaxial structure type: Multi Quantum Well (MQW) lasers, VCSELs, materials for researches on optical non-linearity
Epitaxy-Specific Metrology:
- In-situ reflectance growth rate monitoring and optical pyrometry
- Double crystal X-ray diffraction (single point)
- Photoluminescence (PL) and reflectance (R) mapping
Cost Recovery Based Epitaxy Metrology:
- SIMS profile
- SEM and TEM
- Electrochemical (Polaron) profiling
- Surfscan™ (for defect counting and mapping)
Note: Analysis done on calibration structures and/or actual wafers
Licensing Requirements or Restrictions
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