Fab: AMS 0.35 µm CMOS Process Technology (Basic)
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Minimum Subscription Required:
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Research
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Price for Canadian Academics
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$1,000.00
Description
This 0.35-micron CMOS technology offers four metal layers, digital standard cells, an anti-reflective coating and high-efficiency photodiodes, and bulk micromachining.
CMC's multi-project wafer service delivers this technology from austriamicrosystems through partnership with Circuits Multi Projets (CMP) in France, offering three processes: Basic (see details below), Opto and High-Voltage. The technology is suitable for:
- Embedded photodiodes, high-density CMOS imaging and optoelectronic detection
- High-voltage operation (maximum 20V gate, 50V operating voltage)
- Mixed-signal designs
- High-speed digital circuits
- For the Basic and Opto processes, bulk micromachining of MEMS structures
Potential applications include:
- Biomedical imaging
- Automotive and environmental sensors
Basic Process (C35B4C3) Details:
- Technology Features: 4 metal and 2 poly layers
- Supply Voltage: 3.3/5V
- Bulk-micromachining option, allowing monolithic implementation of MEMS and microelectronics
- For more details see:
http://cmp.imag.fr/products/ic/?p=AMSC35B4C3
Licensing Requirements or Restrictions
Please see He
lp with Licensing to review licensing procedure. For more information, contact our License Administrator at
licensing@cmc.ca or 613-530-4787.
Acknowledging CMC
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